DLI-CVD/DLI-ALD device "MC-050"
Due to lamp heating, RTP and RTCVD processing is possible! Quartz tube-type chamber.
The MC-050 is a DLI-CVD/DLI-ALD system compatible with substrates up to 50mm in diameter. The maximum film formation temperature is 1100°C (lamp heating method), and it can accommodate up to 6 DLI evaporators. Additionally, it can have a maximum of 8 mass flow controllers and is equipped with a turbo pump. Please feel free to contact us for inquiries. 【Features】 ■ Compatible with substrates up to 50mm in diameter ■ Maximum film formation temperature: 1100°C (lamp heating method) ■ Can accommodate up to 6 DLI evaporators ■ Mass flow controllers: up to 8 ■ Quartz tube-type chamber *For more details, please refer to the PDF document or feel free to contact us.
- 企業：ハイテック・システムズ
- 価格：Other
